Fabrication of 3-nm-thick Si3N4 membranes for solid-state nanopores using the poly-Si sacrificial layer process
Yanagi, Itaru, Ishida, Takeshi, Fujisaki, Koji, Takeda, Ken-ichiVolume:
5
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/srep14656
Date:
October, 2015
File:
PDF, 2.50 MB
english, 2015