Barrier tuning of atomic layer deposited Ta...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2017 / 01 Vol. 35; Iss. 1

Barrier tuning of atomic layer deposited Ta 2 O 5 and Al 2 O 3 in double dielectric diodes

Nemr Noureddine, Ibrahim, Sedghi, Naser, Mitrovic, Ivona Z., Hall, Steve
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4974219
Date:
January, 2017
File:
PDF, 1.63 MB
english, 2017
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