A High Deposition Rate Amorphous-Silicon Process for Use as...

Journal of Microelectromechanical Systems 2017 / 4 Vol. 26; Iss. 2

A High Deposition Rate Amorphous-Silicon Process for Use as a Thick Sacrificial Layer in Surface-Micromachining

Zawierta, Michal, Martyniuk, Mariusz, Jeffery, Roger D., Putrino, Gino, Keating, Adrian, Silva, K. K. M. B. Dilusha, Faraone, Lorenzo
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Volume:
26
Language:
english
Journal:
Journal of Microelectromechanical Systems
DOI:
10.1109/JMEMS.2017.2651110
Date:
April, 2017
File:
PDF, 2.26 MB
english, 2017
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