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SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Quantifying imaging performance bounds of extreme dipole illumination in high NA optical lithography
Kasprowicz, Bryan S., Buck, Peter D., Lee, Myungjun, Smith, Mark D., Biafore, John, Graves, Trey, Levy, AdyVolume:
9985
Year:
2016
Language:
english
DOI:
10.1117/12.2240904
File:
PDF, 7.10 MB
english, 2016