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SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Megasonic cleaning strategy for sub-10nm photomasks
Kasprowicz, Bryan S., Buck, Peter D., Hsu, Jyh-Wei, Samayoa, Martin, Dress, Peter, Dietze, Uwe, Ma, Ai-Jay, Lin, Chia-Shih, Lai, Rick, Chang, Peter, Tuo, LaurentVolume:
9985
Year:
2016
Language:
english
DOI:
10.1117/12.2241143
File:
PDF, 568 KB
english, 2016