SPIE Proceedings [SPIE SPIE Photomask Technology - San Jose, California, United States (Monday 12 September 2016)] Photomask Technology 2016 - Improvement of photomask CD uniformity using spatially resolved optical emission spectroscopy
Kasprowicz, Bryan S., Buck, Peter D., Jung, Junhwa, Kim, Youngkeun, Jang, Il-Yong, Kim, Byung-Gook, Jeon, Chan-Uk, Kang, Minwook, Lee, Changmin, Hahn, Jae W.Volume:
9985
Year:
2016
Language:
english
DOI:
10.1117/12.2242406
File:
PDF, 621 KB
english, 2016