Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization
Kim, Jun Beom, Kim, Soo-Hyun, Han, Won Seok, Lee, Do-JoongVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4951691
Date:
July, 2016
File:
PDF, 1.69 MB
english, 2016