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Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features
Huard, Chad M., Zhang, Yiting, Sriraman, Saravanapriyan, Paterson, Alex, Kushner, Mark J.Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4973953
Date:
September, 2017
File:
PDF, 7.03 MB
english, 2017