Processing Technologies for Advanced Ge Devices

ECS Journal of Solid State Science and Technology 2017 Vol. 6; Iss. 1

Processing Technologies for Advanced Ge Devices

Loo, R., Hikavyy, A. Y., Witters, L., Schulze, A., Arimura, H., Cott, D., Mitard, J., Porret, C., Mertens, H., Ryan, P., Wall, J., Matney, K., Wormington, M., Favia, P., Richard, O., Bender, H., Thean
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Volume:
6
Year:
2017
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0301612jss
File:
PDF, 1.24 MB
english, 2017
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