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Chemical and structural investigation of zinc-oxo cluster photoresists for DUV lithography
Yeh, Chun-Cheng, Liu, Hung-Chuan, Heni, Wajdi, Berling, Dominique, Zan, Hsiao-Wen, Soppera, OlivierVolume:
5
Year:
2017
Language:
english
Journal:
J. Mater. Chem. C
DOI:
10.1039/c6tc05201k
File:
PDF, 2.06 MB
english, 2017