Gettering of interstitial iron in silicon by plasma-enhanced chemical vapour deposited silicon nitride films
Liu, A. Y., Sun, C., Markevich, V. P., Peaker, A. R., Murphy, J. D., Macdonald, D.Volume:
120
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4967914
Date:
November, 2016
File:
PDF, 2.01 MB
english, 2016