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Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures
Schwille, Matthias C., Schössler, Timo, Barth, Jonas, Knaut, Martin, Schön, Florian, Höchst, Arnim, Oettel, Martin, Bartha, Johann W.Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4971196
Date:
January, 2017
File:
PDF, 2.29 MB
english, 2017