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[IEEE 2016 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2016.12.3-2016.12.7)] 2016 IEEE International Electron Devices Meeting (IEDM) - Impact of the filament morphology on the retention characteristics of Cu/Al2O3-based CBRAM devices
Ota, K., Belmonte, A., Chen, Z., Redolfi, A., Goux, L., Kar, G. S.Year:
2016
Language:
english
DOI:
10.1109/IEDM.2016.7838464
File:
PDF, 697 KB
english, 2016