Ab initio study of the trimethylaluminum...

Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes—An alternative initial step

Förster, Anja, Wagner, Christian, Schuster, Jörg, Friedrich, Joachim
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4968196
Date:
January, 2017
File:
PDF, 2.00 MB
english, 2017
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