Low-frequency dielectric properties of intrinsic and...

Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO 2 thin films grown by the atomic layer deposition technique

Kassmi, M., Pointet, J., Gonon, P., Bsiesy, A., Vallée, C., Jomni, F.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
119
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4954314
Date:
June, 2016
File:
PDF, 1.22 MB
english, 2016
Conversion to is in progress
Conversion to is failed