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Low-frequency dielectric properties of intrinsic and Al-doped rutile TiO 2 thin films grown by the atomic layer deposition technique
Kassmi, M., Pointet, J., Gonon, P., Bsiesy, A., Vallée, C., Jomni, F.Volume:
119
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4954314
Date:
June, 2016
File:
PDF, 1.22 MB
english, 2016