Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2016 / 07 Vol. 34; Iss. 4
Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method
Kim, Insung, Heo, JinSeok, Park, Changmin, Hwang, Myeongsu, Kim, Seong-Sue, Hahn, Jae W.Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4945806
Date:
July, 2016
File:
PDF, 2.42 MB
english, 2016