Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2015 / 11 Vol. 33; Iss. 6
Highly selective removal of poly(methyl methacrylate) from polystyrene- block -poly(methyl methacrylate) by CO/H 2 plasma etching
Imamura, Tsubasa, Yamamoto, Hiroshi, Omura, Mitsuhiro, Sakai, Itsuko, Hayashi, HisatakaVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4932541
Date:
November, 2015
File:
PDF, 1.18 MB
english, 2015