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Disilane addition versus silane-hydrogen flow rate effect on the PECVD of silicon thin films
Dimitrakellis, Panagiotis, Amanatides, Eleftherios, Mataras, Dimitrios, Kalampounias, Angelos G., Spiliopoulos, Nikolaos, Lahootun, Vanina, Coeuret, François, Madec, AlainVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4966957
Date:
November, 2016
File:
PDF, 1017 KB
english, 2016