Anomalously high alumina atomic layer deposition growth per...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2017 / 01 Vol. 35; Iss. 1

Anomalously high alumina atomic layer deposition growth per cycle during trimethylaluminum under-dosing conditions

Salami, Hossein, Poissant, Andrew, Adomaitis, Raymond A.
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4963368
Date:
January, 2017
File:
PDF, 1.27 MB
english, 2017
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