Cryogenic etching of porous low-k dielectrics in CF...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2017 / 03 Vol. 35; Iss. 2

Cryogenic etching of porous low-k dielectrics in CF 3 Br and CF 4 plasmas

Rezvanov, Askar, Miakonkikh, Andrey V., Vishnevskiy, Alexey S., Rudenko, Konstantin V., Baklanov, Mikhail R.
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4975646
Date:
March, 2017
File:
PDF, 1.44 MB
english, 2017
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