Low-temperature-atomic-layer-deposition of SiO...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2017 / 01 Vol. 35; Iss. 1

Low-temperature-atomic-layer-deposition of SiO 2 using various organic precursors

Ahn, Sehyoung, Kim, Yunsu, Kang, Sangyeoul, Im, Kivin, Lim, Hanjin
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4972211
Date:
January, 2017
File:
PDF, 1.17 MB
english, 2017
Conversion to is in progress
Conversion to is failed