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Low-temperature-atomic-layer-deposition of SiO 2 using various organic precursors
Ahn, Sehyoung, Kim, Yunsu, Kang, Sangyeoul, Im, Kivin, Lim, HanjinVolume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4972211
Date:
January, 2017
File:
PDF, 1.17 MB
english, 2017