Conformal reversal imprint lithography for polymer...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2017 / 03 Vol. 35; Iss. 2

Conformal reversal imprint lithography for polymer nanostructuring over large curved geometries

Dickson, Mary Nora, Tsao, Justin, Liang, Elena I., Navarro, Noel I., Patel, Yash R., Yee, Albert F.
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4974927
Date:
March, 2017
File:
PDF, 1.01 MB
english, 2017
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