Room temperature plasma enhanced atomic layer deposition...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2016 / 01 Vol. 34; Iss. 1

Room temperature plasma enhanced atomic layer deposition for TiO 2 and WO 3 films

Strobel, Alexander, Schnabel, Hans-Dieter, Reinhold, Ullrich, Rauer, Sebastian, Neidhardt, Andreas
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4935356
Date:
January, 2016
File:
PDF, 1.15 MB
english, 2016
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