![](/img/cover-not-exists.png)
Determination of Reactive RF-Sputtering Parameters for Fabrication of SiOx Films With Specified Refractive Index, for Highly Reflective SiOx Distributed Bragg Reflector
Afsharipour, Elnaz, Park, Byoungyoul, Shafai, CyrusVolume:
9
Language:
english
Journal:
IEEE Photonics Journal
DOI:
10.1109/jphot.2017.2649500
Date:
February, 2017
File:
PDF, 782 KB
english, 2017