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X-ray scattering critical dimensional metrology using a compact x-ray source for next generation semiconductor devices
Kline, R. Joseph, Sunday, Daniel F., Windover, Donald, Bunday, Benjamin D.Volume:
16
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.16.1.014001
Date:
February, 2017
File:
PDF, 3.44 MB
english, 2017