Optimization of a chlorine-based deep vertical etch of GaN...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2016 / 05 Vol. 34; Iss. 3

Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness

Tahhan, Maher, Nedy, Joseph, Chan, Silvia H., Lund, Cory, Li, Haoran, Gupta, Geetak, Keller, Stacia, Mishra, Umesh
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4944054
Date:
May, 2016
File:
PDF, 4.25 MB
english, 2016
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