SPIE Proceedings [SPIE SPIE/COS Photonics Asia - Beijing, China (Wednesday 12 October 2016)] Holography, Diffractive Optics, and Applications VII - Design of soft x-ray varied-line-spacing grating based on electron beam lithography-near field lithography
Sheng, Yunlong, Yu, Chongxiu, Zhou, Changhe, Lin, Dakui, Chen, Huoyao, Kroker, Stefanie, Käsebier, Thomas, Liu, Zhengkun, Qiu, Keqiang, Liu, Ying, Kley, Ernst-Bernhard, Xu, Xiangdong, Hong, Yilin, Fu,Volume:
10022
Year:
2016
Language:
english
DOI:
10.1117/12.2246356
File:
PDF, 766 KB
english, 2016