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Uniform Atomic Layer Deposition of Al 2 O 3 on Graphene by Reversible Hydrogen Plasma Functionalization
Vervuurt, René H. J., Karasulu, Bora, Verheijen, Marcel A., Kessels, Wilhelmus (Erwin) M. M., Bol, Ageeth A.Volume:
29
Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/acs.chemmater.6b04368
Date:
March, 2017
File:
PDF, 3.21 MB
english, 2017