Atomic layer deposition of boron-containing films using B 2 F 4
Mane, Anil U., Elam, Jeffrey W., Goldberg, Alexander, Seidel, Thomas E., Halls, Mathew D., Current, Michael I., Despres, Joseph, Byl, Oleg, Tang, Ying, Sweeney, JosephVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4935651
Date:
January, 2016
File:
PDF, 1017 KB
english, 2016