Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma
Abe, Haruhiko, Nishioka, Kyusaku, Tamura, Setsuko, Nishimoto, AkiraVolume:
15
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAPS.15S1.25
Date:
January, 1976
File:
PDF, 1.01 MB
english, 1976