Atomic layer deposition by reaction of molecular oxygen...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2016 / 01 Vol. 34; Iss. 1

Atomic layer deposition by reaction of molecular oxygen with tetrakisdimethylamido-metal precursors

Provine, J, Schindler, Peter, Torgersen, Jan, Kim, Hyo Jin, Karnthaler, Hans-Peter, Prinz, Fritz B.
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4937991
Date:
January, 2016
File:
PDF, 1.43 MB
english, 2016
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