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SPIE Proceedings [SPIE SPIE OPTO - San Francisco, California, United States (Saturday 28 January 2017)] Silicon Photonics XII - Inductively Coupled Plasma etching of Germanium Tin for the fabrication of photonic components

Reed, Graham T., Knights, Andrew P., Milord, L., Aubin, J., Gassenq, A., Tardif, S., Guilloy, K., Pauc, N., Rothman, J., Chelnokov, A., Hartmann, J. M., Calvo, V., Reboud, V.
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Volume:
10108
Year:
2017
Language:
english
DOI:
10.1117/12.2252280
File:
PDF, 514 KB
english, 2017
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