Simulation of SiO 2 etching in...

Modern Physics Letters B 2017 / 02 Vol. 31; Iss. 6

Simulation of SiO 2 etching in an inductively coupled CF 4 plasma

Xu, Qing, Li, Yu-Xing, Li, Xiao-Ning, Wang, Jia-Bin, Yang, Fan, Yang, Yi, Ren, Tian-Ling
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Volume:
31
Language:
english
Journal:
Modern Physics Letters B
DOI:
10.1142/S0217984917500427
Date:
February, 2017
File:
PDF, 724 KB
english, 2017
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