Ultraviolet Nano Imprint Lithography Using Fluorinated...

Ultraviolet Nano Imprint Lithography Using Fluorinated Silicon-Based Resist Materials

Takei, Satoshi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
3
Language:
english
Journal:
Applied Physics Express
DOI:
10.1143/APEX.3.025203
Date:
February, 2010
File:
PDF, 458 KB
english, 2010
Conversion to is in progress
Conversion to is failed