Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon
Chen, Wanghua, Cariou, Romain, Hamon, Gwenaëlle, Léal, Ronan, Maurice, Jean-Luc, Cabarrocas, Pere Roca iVolume:
7
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/srep43968
Date:
March, 2017
File:
PDF, 1.53 MB
english, 2017