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Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
Shih, Huan-Yu, Lee, Wei-Hao, Kao, Wei-Chung, Chuang, Yung-Chuan, Lin, Ray-Ming, Lin, Hsin-Chih, Shiojiri, Makoto, Chen, Miin-JangVolume:
7
Language:
english
Journal:
Scientific Reports
DOI:
10.1038/srep39717
Date:
January, 2017
File:
PDF, 1.23 MB
english, 2017