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Influence of electron-beam lithography exposure current level on the transport characteristics of graphene field effect transistors
Kang, Sangwoo, Movva, Hema C. P., Sanne, Atresh, Rai, Amritesh, Banerjee, Sanjay K.Volume:
119
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4944599
Date:
March, 2016
File:
PDF, 1.51 MB
english, 2016