On the chemical vapour deposition of Ti3SiC2from TiCl4-SiCl4-CH4-H2gas mixtures
C. Racault, F. Langlais, C. BernardVolume:
29
Language:
english
Pages:
18
DOI:
10.1007/bf01151093
Date:
October, 1994
File:
PDF, 1.23 MB
english, 1994