Application of ellipsometry for the accurate oxide layer measurement on silicon spheres
Busch, Ingo, Liu, Wende, Chen, Chi, Luo, Zhiyong, Koenders, LudgerLanguage:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2017.01.125
Date:
January, 2017
File:
PDF, 898 KB
english, 2017