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Understanding the mechanisms of interfacial reactions during TiO 2 layer growth on RuO 2 by atomic layer deposition with O 2 plasma or H 2 O as oxygen source
Chaker, A., Szkutnik, P. D., Pointet, J., Gonon, P., Vallée, C., Bsiesy, A.Volume:
120
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4960139
Date:
August, 2016
File:
PDF, 1.84 MB
english, 2016