Sub-30 keV patterning of HafSOx resist: Effects of voltage...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2016 / 07 Vol. 34; Iss. 4

Sub-30 keV patterning of HafSOx resist: Effects of voltage on resolution, contrast, and sensitivity

Fairley, Kurtis C., Sharps, Meredith C., Mitchson, Gavin, Ditto, Jeffrey, Johnson, Darren W., Johnson, David C.
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4954394
Date:
July, 2016
File:
PDF, 1.41 MB
english, 2016
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