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Plasma chemical etching of photoresist layers based on diazonaphthoquinones in an installation with remote oxygen plasma
Speshilova, A. B., Solov’ev, Yu. V., Alexandrov, S. E.Volume:
89
Language:
english
Journal:
Russian Journal of Applied Chemistry
DOI:
10.1134/S1070427216080164
Date:
August, 2016
File:
PDF, 273 KB
english, 2016