Low temperature plasma-enhanced ALD TiN ultrathin films for Hf 0.5 Zr 0.5 O 2 -based ferroelectric MIM structures
Kozodaev, M. G., Lebedinskii, Y. Y., Chernikova, A. G., Polyakov, S. N., Markeev, A. M.Language:
english
Journal:
physica status solidi (a)
DOI:
10.1002/pssa.201700056
Date:
March, 2017
File:
PDF, 743 KB
english, 2017