Deep UV hardening of photoresist for shaping of graphene...

Carbon 2017 / 07 Vol. 118

Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

Li, Bing, Pan, Genhua, Suhail, Ahmed, Islam, Kamrul, Avent, Neil, Davey, Paul
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Volume:
118
Language:
english
Journal:
Carbon
DOI:
10.1016/j.carbon.2017.03.032
Date:
July, 2017
File:
PDF, 1.27 MB
english, 2017
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