SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Design-Process-Technology Co-optimization for Manufacturability XI - Efficient DSA-DP hybrid lithography conflict detection and guiding template assignment
Capodieci, Luigi, Cain, Jason P., Ou, Jiaojiao, Cline, Brian, Yeric, Greg, Pan, David Z.Volume:
10148
Year:
2017
Language:
english
DOI:
10.1117/12.2258156
File:
PDF, 753 KB
english, 2017