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SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California, United States (Sunday 28 August 2016)] Advances in Metrology for X-Ray and EUV Optics VI - Modeling surface topography of state-of-the-art x-ray mirrors as a result of stochastic polishing process: recent developments
Assoufid, Lahsen, Ohashi, Haruhiko, Asundi, Anand K., Yashchuk, Valeriy V., Centers, Gary, Tyurin, Yuri N., Tyurina, AnastasiaVolume:
9962
Year:
2016
Language:
english
DOI:
10.1117/12.2238260
File:
PDF, 1.80 MB
english, 2016