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SPIE Proceedings [SPIE The International Conference on Micro- and Nano-Electronics 2016 - Zvenigorod, Russian Federation (Monday 3 October 2016)] International Conference on Micro- and Nano-Electronics 2016 - Low-damage plasma etching of porous low-k films in CF 3 Br and CF 4 plasmas under low-temperature conditions
Lukichev, Vladimir F., Rudenko, Konstantin V., Miakonkikh, A., Clemente, I., Vishnevskiy, A., Rudenko, K., Baklanov, M.Volume:
10224
Year:
2016
Language:
english
DOI:
10.1117/12.2267113
File:
PDF, 274 KB
english, 2016