Etching of Ag and Au films in CH 4...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2015 / 01 Vol. 33; Iss. 1

Etching of Ag and Au films in CH 4 -based plasmas at low temperature

Choi, Tae-Seop, Hess, Dennis W.
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4902332
Date:
January, 2015
File:
PDF, 1.96 MB
english, 2015
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