Illumination pupil optimization in 0.33-NA extreme...

Journal of Micro/Nanolithography MEMS and MOEMS 2016 / 11 Vol. 15; Iss. 4

Illumination pupil optimization in 0.33-NA extreme ultraviolet lithography by intensity balancing for semi-isolated dark field two-bar M1 building blocks

Last, Thorsten, de Winter, Laurens, van Adrichem, Paul, Finders, Jo
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Volume:
15
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.15.4.043508
Date:
November, 2016
File:
PDF, 2.60 MB
english, 2016
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