Process- and optoelectronic-control of NiO x...

Journal of Applied Physics 2017 / 05 Vol. 121; Iss. 17

Process- and optoelectronic-control of NiO x thin films deposited by reactive high power impulse magnetron sputtering

Keraudy, Julien, Delfour-Peyrethon, Brice, Ferrec, Axel, Garcia Molleja, Javier, Richard-Plouet, Mireille, Payen, Christophe, Hamon, Jonathan, Corraze, Benoît, Goullet, Antoine, Jouan, Pierre-Yves
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
121
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4978349
Date:
May, 2017
File:
PDF, 2.76 MB
english, 2017
Conversion to is in progress
Conversion to is failed